The electron-phonon relaxation time in thin superconducting titanium nitride films

Kardakova, A., Finkel, M., Morozov, D. , Kovalyuk, V., An, P., Dunscombe, C., Tarkhov, M., Mauskopf, P., Klapwijk, T. M. and Goltsman, G. (2013) The electron-phonon relaxation time in thin superconducting titanium nitride films. Applied Physics Letters, 103(25), 252602. (doi: 10.1063/1.4851235)

Abstract

We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

• Item Type: Articles
• Keywords: TiN, electron-phonon, superconducting, kinetic inductance, HEB, hot electrons, KID.
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Morozov, Dr Dmitry
• Authors: Kardakova, A., Finkel, M., Morozov, D., Kovalyuk, V., An, P., Dunscombe, C., Tarkhov, M., Mauskopf, P., Klapwijk, T. M., and Goltsman, G.
• Subjects: Q Science > QC Physics
• College/School: College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
• Journal Name: Applied Physics Letters
• Journal Abbr.: APL
• Publisher: AIP Publishing
• ISSN: 0003-6951
• ISSN (Online): 1077-3118
• Published Online: 18 December 2013
• Copyright Holders: Copyright © 2013 AIP Publishing LLC
• First Published: First published in Applied Physics Letters 103(25): 252602
• Publisher Policy: Reproduced in accordance with the publisher copyright policy