Li, X. , Gay, D.L., McNeill, D.W. and Armstrong, B.M. (1997) Low Temperature CVD of Tantalum Oxide Films, International Symposium on Chemical Vapour Deposition. In: CVD-XIV and EUROCVD 11, Paris, France, Aug 1997,
Full text not currently available from Enlighten.
Abstract
No abstract available.
| Item Type: | Conference Proceedings |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Li, Dr Xu |
| Authors: | Li, X., Gay, D.L., McNeill, D.W., and Armstrong, B.M. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
University Staff: Request a correction | Enlighten Editors: Update this record
Deposit and Record Details
Deposit and Record Details