Li, X. , Floros, K., Cho, S.-J., Guiney, I., Moran, D. and Thayne, I. G. (2016) An Atomic Layer Etch Process Based on a Cycled Procedure of Chlorination in Cl2 and Argon Plasma Removal of Chlorides for GaN Based Device Fabrication. In: 8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma-Nano Technology & Science (ISPlasma2016 / IC-PLANTS2016), Nagoya, Japan, 6-10 March 2016,
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Abstract
No abstract available.
Item Type: | Conference Proceedings |
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Additional Information: | Excellent Presentation Award. |
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Li, Dr Xu and Cho, Dr Sung-Jin and Thayne, Prof Iain and Moran, Professor David |
Authors: | Li, X., Floros, K., Cho, S.-J., Guiney, I., Moran, D., and Thayne, I. G. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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