Wood, M.A., Riehle, M. and Wilkinson, C.D.W. (2002) Patterning colloidal nanotopographies. Nanotechnology, 13, pp. 605-609. (doi: 10.1088/0957-4484/13/5/312)
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Abstract
Creating a device where cell reactions to nanoscale topographies and a control (usually planar) surface can be monitored simultaneously is advantageous from a biological perspective. Through the utilization of both natural lithography and conventional photolithography techniques, it has been possible to create a structure where planar and nanopillared surfaces lie collaterally on one device. By patterning an optical resist, exposing this to the desired mask pattern, developing and coating in poly-L-lysine, a surface adhesive to gold colloidal particles is presented. Following immersion in a colloidal sol, in this case a 20 nm diameter gold colloidal sol, colloids adhere to the poly-L-lysine across the primed surface. In a subsequent dry etch step, the colloids that are present where the resist has been removed act as an etch mask, resulting in pillars being etched into the surface of a base substrate, in this instance either silicon or quartz. By removing the resist and also the colloids, a device results where planar and nanopillared areas lie collaterally. This allows cell reactions on the two surfaces to be monitored simultaneously.
Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Riehle, Dr Mathis |
Authors: | Wood, M.A., Riehle, M., and Wilkinson, C.D.W. |
College/School: | College of Medical Veterinary and Life Sciences > School of Molecular Biosciences |
Journal Name: | Nanotechnology |
Publisher: | IOP Publishing |
ISSN: | 0957-4484 |
ISSN (Online): | 1361-6528 |
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