Cho, S.-J., Roberts, J.W., Li, X. , Ternent, G., Floros, K., Thayne, I. , Chalker, P. and Wasige, E. (2014) Effect of O2 plasma pre-treatment in Al2O3 passivation using atomic-layer-deposited on GaN based metal-oxide-semiconductor capacitor. In: UK Semiconductors 2014, Sheffield, UK, 9-10 Jul 2014, p. 184.
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Publisher's URL: http://ssg.sheffield.ac.uk/events/uk-semiconductors-2014/
Abstract
No abstract available.
Item Type: | Conference Proceedings |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Wasige, Professor Edward and Thayne, Prof Iain and Ternent, Dr Gary and Li, Dr Xu and Cho, Dr Sung-Jin |
Authors: | Cho, S.-J., Roberts, J.W., Li, X., Ternent, G., Floros, K., Thayne, I., Chalker, P., and Wasige, E. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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