Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications

Dahiya, R. S. , Valle, M., Metta, G., Lorenzelli, L. and Pedrotti, S. (2008) Deposition, processing and characterization of P(VDF-TrFE) thin films for sensing applications. In: 2008 IEEE Sensors, Lecce, Italy, 26-29 Oct 2008, pp. 490-493. (doi:10.1109/ICSENS.2008.4716484)

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Publisher's URL: http://dx.doi.org/10.1109/ICSENS.2008.4716484

Abstract

This work presents wafer level deposition of thin polyvinylidene fluoride-trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and the spinnerpsilas speed. Absence of any standard method makes it difficult to etch the polymer films from places like pads. A new dry etch recipe, developed for this purpose was used for the selective etching of polymer films. In situ polarization of the polymer film has also been addressed.

Item Type:Conference Proceedings
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Dahiya, Professor Ravinder
Authors: Dahiya, R. S., Valle, M., Metta, G., Lorenzelli, L., and Pedrotti, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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