Mirza, M. M. , Zhou, H., Velha, P., Li, X. , Docherty, K. E., Samarelli, A., Ternent, G. and Paul, D. J. (2012) Nanofabrication of high aspect ratio (˜50:1) sub-10 nm silicon nanowires using inductively coupled plasma etching. In: EIPBN 2012: The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Waikoloa,HI USA, 29 May - 01 June 2012,
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Abstract
No abstract available.
| Item Type: | Conference Proceedings |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Mirza, Dr Muhammad M A and Zhou, Dr Haiping and Ternent, Dr Gary and Velha, Mr Philippe and Samarelli, Mr Antonio and Li, Dr Xu and Paul, Professor Douglas |
| Authors: | Mirza, M. M., Zhou, H., Velha, P., Li, X., Docherty, K. E., Samarelli, A., Ternent, G., and Paul, D. J. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| Research Group: | Semiconductor Device Group and James Watt Nanofabrication Centre |
| Journal Name: | Journal of Vacuum Science and Technology B Microelectronics and Nanometer Structures |
| ISSN: | 2166-2746 |
| ISSN (Online): | 1520-8567 |
| Related URLs: |
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