A simple silicon compatible 40 nm electroplated Copper T‐gate process

Cao, M., Li, X. , Ferguson, S., Thoms, S. , Macintyre, D. and Thayne, I. (2013) A simple silicon compatible 40 nm electroplated Copper T‐gate process. In: MNE2013: 39th International Conference on Micro and Nano Engineering, London, UK, 16-19 Sept. 2013,

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Publisher's URL: http://www.mne2013.org/

Abstract

No abstract available.

Item Type:Conference Proceedings
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Ferguson, Mrs Susan and Li, Dr Xu and Thayne, Professor Iain and Macintyre, Dr Douglas and Thoms, Dr Stephen
Authors: Cao, M., Li, X., Ferguson, S., Thoms, S., Macintyre, D., and Thayne, I.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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