Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography

Zhou, H., Midha, A., Mills, G., Thoms, S. , Murad, S.K. and Weaver, J.M.R. (1998) Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 16(1), pp. 54-58. (doi:10.1116/1.589835)

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Abstract

We present a novel method for the fabrication of generic scanned-probe microscope probes by performing multiple level direct-write electron-beam lithography on the apex of micromachined atomic force microscope tips. Pattern transfer is by conventional etching or liftoff in a wide range of materials. Lithographic resolution is 50 nm or better. The substrates support the use of automatic alignment and allow for the fabrication of 50 probes/in2. The integration of a force-sensing cantilever permits simple height regulation of the probes during operation. The technology is illustrated by the fabrication of thermocouple and near-field optical probes.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Zhou, Dr Haiping and Weaver, Professor Jonathan and Thoms, Dr Stephen
Authors: Zhou, H., Midha, A., Mills, G., Thoms, S., Murad, S.K., and Weaver, J.M.R.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
ISSN:2166-2746
ISSN (Online):2166-2754

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