Novel scanning near-field optical microscopy/atomic force microscope probes by combined micromachining and electron-beam nanolithography

Zhou, H., Midha, A., Bruchhaus, L., Mills, G., Donaldson, L. and Weaver, J.M.R. (1999) Novel scanning near-field optical microscopy/atomic force microscope probes by combined micromachining and electron-beam nanolithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 17(5), p. 1954. (doi:10.1116/1.590855)

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Abstract

We have developed novel probes which allow scanning near-field optical microscopy to be performed in a conventional atomic force microscope(AFM). Direct-write electron-beam lithography and siliconmicromachining have been used in a reliable batch process which allows the production of many probes at once without resort to handicraft. The aperture is situated at the hollow tip apex of a conventional silicon nitrideAFM cantilever. Since there is no waveguide cutoff, the overall light throughput is dramatically enhanced. The integration of a conventional force microscope cantilever with the aperture allows more reliable and better control of the aperture-sample distance than that obtained by “shear-force” detection. In addition, since the apertures are defined by lithographic means, the size and shape of apertures are well controlled and reproducible. We present the first results of near-field optical imaging and luminescence imaging using these probes demonstrating excellent light throughput and also good spatial and spectral resolution.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Zhou, Dr Haiping and Weaver, Professor Jonathan
Authors: Zhou, H., Midha, A., Bruchhaus, L., Mills, G., Donaldson, L., and Weaver, J.M.R.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
ISSN:2166-2746
ISSN (Online):2166-2754

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