Zhou, H., Mills, G., Chong, B.K., Midha, A., Donaldson, L. and Weaver, J.M.R. (1999) Recent progress in the functionalization of atomic force microscope probes using electron-beam nanolithography. Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 17(4), pp. 2233-2239. (doi: 10.1116/1.581753)
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Abstract
We present recent work in which direct-write electron-beam lithography has been used to fabricate near-field optical, thermal and magnetic sensors. Key fabrication issues affecting the performance of these probes are discussed and recent fabrication results are presented.
Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Zhou, Dr Haiping and Weaver, Professor Jonathan |
Authors: | Zhou, H., Mills, G., Chong, B.K., Midha, A., Donaldson, L., and Weaver, J.M.R. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Journal Name: | Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films |
Publisher: | American Vacuum Society |
ISSN: | 0734-2101 |
ISSN (Online): | 1520-8559 |
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