Recent progress in the functionalization of atomic force microscope probes using electron-beam nanolithography

Zhou, H., Mills, G., Chong, B.K., Midha, A., Donaldson, L. and Weaver, J.M.R. (1999) Recent progress in the functionalization of atomic force microscope probes using electron-beam nanolithography. Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 17(4), pp. 2233-2239. (doi:10.1116/1.581753)

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Abstract

We present recent work in which direct-write electron-beam lithography has been used to fabricate near-field optical, thermal and magnetic sensors. Key fabrication issues affecting the performance of these probes are discussed and recent fabrication results are presented.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Zhou, Dr Haiping and Weaver, Professor Jonathan
Authors: Zhou, H., Mills, G., Chong, B.K., Midha, A., Donaldson, L., and Weaver, J.M.R.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
Publisher:American Vacuum Society
ISSN:0734-2101
ISSN (Online):1520-8559

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