Lithographically defined nano and micro sensors using "float coating" of resist and electron beam lithography

Zhou, H., Chong, B.K., Stopford, P., Mills, G., Midha, A., Donaldson, L. and Weaver, J. (2000) Lithographically defined nano and micro sensors using "float coating" of resist and electron beam lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18(6), pp. 3594-3599. (doi: 10.1116/1.1321271)

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Abstract

The combination of direct-write electron beamlithography and bulk siliconmicromachining is shown to give great flexibility in the definition of nanosensors. The technique is based on a novel method for coating the specimen with electron beam resist allowing high resolution features to be defined on the top of micromachined asperities or in 200 μm deep etched holes. Examples of sensors fabricated using this method include advanced magnetic nanosensors such as Hall probe sensors,electromagnetic coils or combined coils and Hall probes. Near-field optical atomic force microscope probes are demonstrated with reproducible aperture size down to 20×35 nm. Near-field optical probes using a shaped aperture to allow the passage of linearly polarized light are shown to offer optical throughputs up to 2% with modest collection optics. The use of a near-field optical probe having a crossed slit form is demonstrated to give high throughput and resolution in two dimensions for the imaging of fluorescent objects. Near-field optical probes with multiple apertures of closely matched size are demonstrated.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Zhou, Dr Haiping and Weaver, Professor Jonathan and Donaldson, Mrs Lesley
Authors: Zhou, H., Chong, B.K., Stopford, P., Mills, G., Midha, A., Donaldson, L., and Weaver, J.
College/School:College of Science and Engineering
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
ISSN:2166-2746
ISSN (Online):2166-2754

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