Critical current diffraction pattern of SIFS Josephson junctions with a step-like F-layer

Weides, M. , Peralagu, U. , Kohlstedt, H., Pfeiffer, J., Kemmler, M., Gurlich, C., Goldobin, E., Koelle, D. and Kleiner, R. (2010) Critical current diffraction pattern of SIFS Josephson junctions with a step-like F-layer. Superconductor Science and Technology, 23(9), 095007. (doi:10.1088/0953-2048/23/9/095007)

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Abstract

We present the latest generation of superconductor–insulator–ferromagnet–superconductor Josephson tunnel junctions with a step-like thickness of the ferromagnetic (F) layer. The F-layer thicknesses d1 and d2 in both halves were varied to obtain different combinations of positive and negative critical current densities jc, 1 and jc, 2. The measured dependences of the critical current on applied magnetic field can be well described by a model which takes into account different critical current densities (obtained from reference junctions) and different net magnetization of the multidomain ferromagnetic layer in both halves.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Weides, Professor Martin and Peralagu, Mr Uthayasankaran
Authors: Weides, M., Peralagu, U., Kohlstedt, H., Pfeiffer, J., Kemmler, M., Gurlich, C., Goldobin, E., Koelle, D., and Kleiner, R.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Superconductor Science and Technology
Publisher:Institute of Physics
ISSN:0953-2048
ISSN (Online):1361-6668

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