Effect of tow meander on the shear compliance of woven engineering fabrics measured using the biaxial bias extension test

Abdiwi, F., Harrison, P. and Yu, W.-R. (2013) Effect of tow meander on the shear compliance of woven engineering fabrics measured using the biaxial bias extension test. Key Engineering Materials, 554, pp. 402-409. (doi:10.4028/www.scientific.net/KEM.554-557.402)

Full text not currently available from Enlighten.

Publisher's URL: http://www.ttp.net/1013-9826/Books.html

Abstract

In this paper, a non-orthogonal constitutive model [1] is used to investigate the effect of sample misalignment due to ‘tow meander’, across the initial blank sheet on the shear compliance of a woven glass fabric, as measured using the biaxial bias extension test with various transverse loads applied [2]. The same statistical distribution and spatial correlations of shear angles observed in the woven glass fabric have been automatically reproduced using ‘VarifabGA’ [3]. The effect of realistic tow directional variability is investigated by generating blanks using VarifabGA and then simulating the biaxial bias extension test using the finite element software, Abaqus ExplicitTM. In order to assign the initial fiber orientation to each element in the mesh, a unique element set is assigned to each element. A MatlabTM code 'InitialAngle.m' has been written to produce two input files; the first 'Mat.inp' includes the material property parameters of each element and the second 'Sec.inp' includes the sections of those elements. Finally, a comparison between the experimental and predicted shear compliance shows the effect of tow directional variability.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Harrison, Dr Philip
Authors: Abdiwi, F., Harrison, P., and Yu, W.-R.
College/School:College of Science and Engineering > School of Engineering > Systems Power and Energy
Journal Name:Key Engineering Materials
Publisher:Scientific.net
ISSN:1013-9826

University Staff: Request a correction | Enlighten Editors: Update this record