Controlling flux flow dissipation by changing flux pinning in superconducting films

Grimaldi, G., Leo, A., Nigro, A., Silhanek, A.V., Verellen, N., Moshchalkov, V.V., Milošević, M.V., Casaburi, A. , Cristiano, R. and Pace, S. (2012) Controlling flux flow dissipation by changing flux pinning in superconducting films. Applied Physics Letters, 100(20), p. 202601. (doi:10.1063/1.4718309)

Full text not currently available from Enlighten.

Abstract

We study the flux flow state in superconducting materials characterized by rather strong intrinsic pinning, such as Nb, NbN, and nanostructured Al thin films, in which we drag the superconducting dissipative state into the normal state by current biasing. We modify the vortex pinning strength either by ion irradiation, by tuning the measuring temperature or by including artificial pinning centers. We measure critical flux flow voltages for all materials and the same effect is observed: switching to low flux flow dissipations at low fields for an intermediate pinning regime. This mechanism offers a way to additionally promote the stability of the superconducting state.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Casaburi, Dr Alessandro
Authors: Grimaldi, G., Leo, A., Nigro, A., Silhanek, A.V., Verellen, N., Moshchalkov, V.V., Milošević, M.V., Casaburi, A., Cristiano, R., and Pace, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Applied Physics Letters
ISSN:0003-6951
Published Online:14 May 2012

University Staff: Request a correction | Enlighten Editors: Update this record