Khalid, A. , Li, C. , Grant, J. , Saha, S., Ferguson, S. and Cumming, D. (2012) Simple e-beam air-bridge technology for mm-wave applications. Microelectronic Engineering, 98, pp. 262-265. (doi: 10.1016/j.mee.2012.06.006)
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Publisher's URL: http://dx.doi.org/10.1016/j.mee.2012.06.006
Abstract
We describe a new air-bridge fabrication technology using electron beam lithography. This novel technique greatly simplifies the lithographic process, eliminating the requirement for complex writing control procedures used in established electron-beam lithography based processes. The new technique is demonstrated using single-dose per layer electron beam lithography and is applied to the fabrication of microwave and millimeter-wave waveguide structures.
| Item Type: | Articles |
|---|---|
| Additional Information: | Special issue MNE 2011 - Part II |
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Saha, Dr Shimul and Li, Professor Chong and Cumming, Professor David and Grant, Dr James and Khalid, Dr Ata-Ul-Habib and Ferguson, Mrs Susan |
| Authors: | Khalid, A., Li, C., Grant, J., Saha, S., Ferguson, S., and Cumming, D. |
| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| Research Group: | MicroSystem Technology |
| Journal Name: | Microelectronic Engineering |
| ISSN: | 0167-9317 |
| ISSN (Online): | 1873-5568 |
| Published Online: | 27 June 2012 |
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