Bell, A.S., Pfau, T., Drodofsky, U., Stuhler, J., Schulze, Th., Brezger, B., Nowak, S., and Mlynek, J. (1998) Atomic lithography. Microelectronic Engineering, 41-42 . pp. 587-590. ISSN 0167-9317 (doi:10.1016/S0167-9317(98)00138-5)
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Publisher's URL: http://dx.doi.org/10.1016/S0167-9317(98)00138-5
Neutral atoms have been used to write two dimensional structures on silicon substrates. Two different methods have been used. In one experiment chromium atoms were deposited directly using standing wave light masks. In a second experiment, a self-assembling monolayer was used as a resist for metastable helium atoms in a proximity printing experiment.
|Glasgow Author(s):||Bell, Dr Angus|
|Authors:||Bell, A.S., Pfau, T., Drodofsky, U., Stuhler, J., Schulze, Th., Brezger, B., Nowak, S., and Mlynek, J.|
|College/School:||College of Science and Engineering > School of Physics and Astronomy|
|Journal Name:||Microelectronic Engineering|
|Published Online:||11 June 1999|