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Atomic lithography

Bell, A.S., Pfau, T., Drodofsky, U., Stuhler, J., Schulze, T., Brezger, B., Nowak, S., and Mlynek, J. (1998) Atomic lithography. Microelectronic Engineering, 41-42 . pp. 587-590. ISSN 0167-9317 (doi:10.1016/S0167-9317(98)00138-5)

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Publisher's URL: http://dx.doi.org/10.1016/S0167-9317(98)00138-5

Abstract

Neutral atoms have been used to write two dimensional structures on silicon substrates. Two different methods have been used. In one experiment chromium atoms were deposited directly using standing wave light masks. In a second experiment, a self-assembling monolayer was used as a resist for metastable helium atoms in a proximity printing experiment.

Item Type:Article
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Bell, Dr Angus
Authors: Bell, A.S., Pfau, T., Drodofsky, U., Stuhler, J., Schulze, T., Brezger, B., Nowak, S., and Mlynek, J.
College/School:College of Science and Engineering > School of Physics and Astronomy
Journal Name:Microelectronic Engineering
ISSN:0167-9317
ISSN (Online):1873-5568
Published Online:11 June 1999

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