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Bell, A.S., Brezger, B., Drodofsky, U., Nowak, S., Pfau, T., Stuhler, J., Schulze, Th., and Mlynek, J. (1999) Nano-lithography with atoms. Surface Science, 433-43 (2). pp. 40-47. ISSN 0039-6028 (doi:10.1016/S0039-6028(99)00083-7)
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Publisher's URL: http://dx.doi.org/10.1016/S0039-6028(99)00083-7
Abstract
The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithography is presented. The methods and results from various groups are discussed. A more in-depth study of three different types of atom lithography undertaken in our group is given.
| Item Type: | Article |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s): | Bell, Dr Angus |
| Authors: | Bell, A.S., Brezger, B., Drodofsky, U., Nowak, S., Pfau, T., Stuhler, J., Schulze, Th., and Mlynek, J. |
| College/School: | College of Science and Engineering > School of Physics and Astronomy |
| Journal Name: | Surface Science |
| ISSN: | 0039-6028 |
| ISSN (Online): | 1879-2758 |
| Published Online: | 21 August 2000 |
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