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Nano-lithography with atoms

Bell, A.S., Brezger, B., Drodofsky, U., Nowak, S., Pfau, T., Stuhler, J., Schulze, T., and Mlynek, J. (1999) Nano-lithography with atoms. Surface Science, 433-43 (2). pp. 40-47. ISSN 0039-6028 (doi:10.1016/S0039-6028(99)00083-7)

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Publisher's URL: http://dx.doi.org/10.1016/S0039-6028(99)00083-7

Abstract

The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithography is presented. The methods and results from various groups are discussed. A more in-depth study of three different types of atom lithography undertaken in our group is given.

Item Type:Article
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Bell, Dr Angus
Authors: Bell, A.S., Brezger, B., Drodofsky, U., Nowak, S., Pfau, T., Stuhler, J., Schulze, T., and Mlynek, J.
College/School:College of Science and Engineering > School of Physics and Astronomy
Journal Name:Surface Science
ISSN:0039-6028
ISSN (Online):1879-2758
Published Online:21 August 2000

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