Bell, A.S., Brezger, B., Drodofsky, U., Nowak, S., Pfau, T., Stuhler, J., Schulze, T., and Mlynek, J. (1999) Nano-lithography with atoms. Surface Science, 433-43(2), pp. 40-47. (doi:10.1016/S0039-6028(99)00083-7)
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Publisher's URL: http://dx.doi.org/10.1016/S0039-6028(99)00083-7
The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithography is presented. The methods and results from various groups are discussed. A more in-depth study of three different types of atom lithography undertaken in our group is given.
|Glasgow Author(s) Enlighten ID:||Bell, Dr Angus|
|Authors:||Bell, A.S., Brezger, B., Drodofsky, U., Nowak, S., Pfau, T., Stuhler, J., Schulze, T., and Mlynek, J.|
|College/School:||College of Science and Engineering > School of Physics and Astronomy|
|Journal Name:||Surface Science|
|Published Online:||21 August 2000|
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