CMOS photodetectors integrated with plasmonic color filters

Chen, Q., Chitnis, D., Walls, K., Drysdale, T.D., Collins, S. and Cumming, D.R.S. (2012) CMOS photodetectors integrated with plasmonic color filters. IEEE Photonics Technology Letters, 24(3), pp. 197-199. (doi: 10.1109/LPT.2011.2176333)

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A single-pixel plasmonic complementary metal oxide semiconductor (CMOS) photo sensor consisting of a plasmonic color filter integrated on a CMOS photodiode was fabricated using electron beam lithography and dry etch. The photocurrent measurement results confirmed the three primary color filtering responses that could be achieved in a single layer of nanostructured aluminium film. Finite-difference time-domain simulation demonstrated a good agreement of the reflection spectra with the measured result. This research can lead to the development of advanced CMOS image sensors with low cost and low crosstalk.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Cumming, Professor David and Walls, Miss Kirsty and Drysdale, Dr Timothy and Chen, Dr Qin
Authors: Chen, Q., Chitnis, D., Walls, K., Drysdale, T.D., Collins, S., and Cumming, D.R.S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:IEEE Photonics Technology Letters
Published Online:16 November 2011

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
479851Digital imaging enhanced by plasmon resonance elementsDavid CummingEngineering & Physical Sciences Research Council (EPSRC)EP/G008329/1Electronic and Nanoscale Engineering