Full-thickness characterization of plasma polymerized hexane films irradiated by an electron beam

Pedersen, R.H., Scurr, D.J., Roach, P., Alexander, M.R. and Gadegaard, N. (2012) Full-thickness characterization of plasma polymerized hexane films irradiated by an electron beam. Plasma Processes and Polymers, 9(1), pp. 22-27. (doi:10.1002/ppap.201100067)

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Publisher's URL: http://dx.doi.org/10.1002/ppap.201100067

Abstract

Thin plasma polymerized hexane (ppHex) films have been shown to be useful as a novel resist for electron beam lithography. We present time-of-flight secondary ion mass spectroscopy analysis of similar to 50?nm thick ppHex films deposited at two different RF powers (10 and 50?W) followed by exposure to an electron beam at various doses. As-deposited, high-power and low-power films exhibit differences in chemical composition, explaining an experimentally observed difference in solubility. Exposure of the ppHex films to an electron beam at high doses (>5?mC?cm-2) increases the amount of cross-linking in the ppHex film, rendering them insoluble in a developer, and allowing for the material to be used as a novel resist for electron beam lithography.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Pedersen, Mr Rasmus and Gadegaard, Professor Nikolaj
Authors: Pedersen, R.H., Scurr, D.J., Roach, P., Alexander, M.R., and Gadegaard, N.
College/School:College of Science and Engineering > School of Engineering > Biomedical Engineering
Journal Name:Plasma Processes and Polymers
Publisher:Wiley
ISSN:1612-8850
ISSN (Online):1612-8869
Published Online:10 October 2011

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
474131Artificial photosynthesis: Solar fuelsRichard CogdellEngineering & Physical Sciences Research Council (EPSRC)EP/F047851/1Institute of Molecular Cell and Systems Biology