Electron beam lithography of bulk zinc oxide wafers using a polythiophene-based charge dissipation layer

Dylewicz, R., De La Rue, R.M. , Lis, S. and Rahman, F. (2010) Electron beam lithography of bulk zinc oxide wafers using a polythiophene-based charge dissipation layer. In: 15th European Conference on Integrated Optics (ECIO 2010), Cambridge, England, 7-9 April 2010,

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Item Type:Conference Proceedings
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Rahman, Dr Faiz and De La Rue, Professor Richard and Dylewicz, Dr Rafal
Authors: Dylewicz, R., De La Rue, R.M., Lis, S., and Rahman, F.
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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