Low-temperature molecular beam epitaxy growth of Si/SiGe THz quantum cascade structures on virtual substrates

Zhao, M., Ni, W.X., Townsend, P., Lynch, S.A., Paul, D.J. , Hsu, C.C. and Chang, M.N. (2006) Low-temperature molecular beam epitaxy growth of Si/SiGe THz quantum cascade structures on virtual substrates. Thin Solid Films, 508(1-2), pp. 24-28. (doi:10.1016/j.tsf.2005.07.355)

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Abstract

Si/SiGe quantum cascade structures containing superlattice up to 100 periods have been grown on SiGe virtual substrates by using solid-source molecular beam epitaxy at low temperature. The surface morphology and structural properties of the grown samples were characterized using various experimental techniques. It has been concluded that the structures were completely symmetrically strained with high crystalline quality, precise layer parameters, and excellent reproducibility. Electroluminescence was observed with peaked intensity at ∼3 THz at both 4 and 40 K, which agrees very well with expected interwell intersubband transition according to the design.

Item Type:Articles
Additional Information:Proceedings of the 4th International Conference on Silicon Epitaxy and Heterostructures, Awaji Island, Hyogo, Japan, 23-26 May 2005
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Paul, Professor Douglas
Authors: Zhao, M., Ni, W.X., Townsend, P., Lynch, S.A., Paul, D.J., Hsu, C.C., and Chang, M.N.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Research Group:Semiconductor Devices
Journal Name:Thin Solid Films
Publisher:Elsevier
ISSN:0040-6090
ISSN (Online):0040-6090

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