Taking, S., Khokhar, A., MacFarlane, D., Sharabi, S., Dabiran, A.M. and Wasige, E. (2010) New Process for Low Sheet and Ohmic Contact Resistance of AlN/GaN MOS-HEMTs. In: The 5th European Microwave Integrated Circuits Conference, Proceedings, France, 26th Sept – 1st Oct 2010,
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Item Type: | Conference Proceedings |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Wasige, Professor Edward and Khokhar, Dr Ali |
Authors: | Taking, S., Khokhar, A., MacFarlane, D., Sharabi, S., Dabiran, A.M., and Wasige, E. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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