Thoms, S. and Macintyre, D.S. (2010) Linewidth measurement for sub-10 nm lithography. In: 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, Anchorage, USA, June 2010,
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| Item Type: | Conference Proceedings |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Thoms, Dr Stephen and Macintyre, Dr Douglas |
| Authors: | Thoms, S., and Macintyre, D.S. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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