Linewidth measurement for sub-10 nm lithography

Thoms, S. and Macintyre, D.S. (2010) Linewidth measurement for sub-10 nm lithography. In: 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, Anchorage, USA, June 2010,

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Item Type:Conference Proceedings
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Macintyre, Dr Douglas and Thoms, Dr Stephen
Authors: Thoms, S., and Macintyre, D.S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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