High-performance red lasers with low beam divergence

Qiu, B., Kowalski, O.P., McDougall, S., Schmidt, B. and Marsh, J. (2009) High-performance red lasers with low beam divergence. IEEE Photonics Journal, 1(3), 172 -177. (doi: 10.1109/JPHOT.2009.2030159)

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Abstract

We report the design and fabrication of high-performance 650-nm lasers using a novel wafer structure that offers substantially independent control of the vertical far field and of the optical confinement factor. By incorporating a graded V-shaped layer into the epitaxial structure, a low divergence can be realized while retaining high optical overlap with the quantum wells and, therefore, a low threshold current. Broad-area lasers (BALs) were fabricated for a range of designs, and close agreement was obtained between the modeling and the experiment.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Marsh, Professor John
Authors: Qiu, B., Kowalski, O.P., McDougall, S., Schmidt, B., and Marsh, J.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:IEEE Photonics Journal
ISSN:1943-0655

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