Impact of metal gate granularity on threshold voltage variability: a full-scale 3D statistical simulation study

Brown, A., Idris, N., Watling, J. and Asenov, A. (2010) Impact of metal gate granularity on threshold voltage variability: a full-scale 3D statistical simulation study. IEEE Electron Device Letters, 31(11), pp. 1199-1201. (doi:10.1109/LED.2010.2069080)

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Abstract

It has recently become clear that the use of high-κ /metal gate stacks will have a distinct impact on the intrinsic parameter variability of the corresponding CMOS devices. The metal gates have a natural granularity, with the work function of each grain depending on its orientation. Here, we present a full-scale 3-D statistical simulation study of the statistical variability induced by this metal gate granularity (MGG). We investigate the effect of grain size on both the magnitude of the variability and the shape of the corresponding statistical distribution. The distributions in threshold voltage due to MGG are analyzed in isolation and in combination with random discrete dopants and line-edge roughness.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Watling, Dr Jeremy and Brown, Mr Andrew and Asenov, Professor Asen
Authors: Brown, A., Idris, N., Watling, J., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:IEEE Electron Device Letters
Publisher:Institute of Electrical and Electronics Engineers
ISSN:0741-3106
ISSN (Online):1558-0563
Published Online:01 January 2010

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