Nanopatterned UV curable hydrogels for biomedical applications

Gaston, A., Khokhar, A.Z., Bilbao, L., Saez-Martinez, V., Corres, A., Obieta, I. and Gadegaard, N. (2010) Nanopatterned UV curable hydrogels for biomedical applications. Microelectronic Engineering, 87(5-8), pp. 1057-1061. (doi:10.1016/j.mee.2009.11.089)

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Publisher's URL: http://dx.doi.org/10.1016/j.mee.2009.11.089

Abstract

With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.

Item Type:Articles
Keywords:Fabrication, flash imprint, HSQ, microstructures, PEG, physics, technologie, Technology, UV-NIL, water
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Khokhar, Dr Ali and Gadegaard, Professor Nikolaj
Authors: Gaston, A., Khokhar, A.Z., Bilbao, L., Saez-Martinez, V., Corres, A., Obieta, I., and Gadegaard, N.
College/School:College of Science and Engineering > School of Engineering > Biomedical Engineering
Journal Name:Microelectronic Engineering
ISSN:0167-9317
Published Online:23 November 2009

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