Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

Elfstrom, D. et al. (2009) Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes. Optics Express, 17(26), pp. 23522-23529. (doi:10.1364/OE.17.023522)

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Abstract

We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8W/cm(2) per imaged pixel in circular spots of diameter similar to 8 mu m. We show example structures written in positive as well as in negative photoresist.

Item Type:Articles
Keywords:Arrays, CMOS, diodes, light, lithography, semiconductor, substrate, system
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Cooper, Professor Jonathan and Blanco-Gomez, Mr Gerald
Authors: Elfstrom, D., Guilhabert, B., McKendry, J., Poland, S., Gong, Z., Massoubre, D., Richardson, E., Rae, B.R., Valentine, G., Blanco-Gomez, G., Gu, E., Cooper, J.M., Henderson, R.K., and Dawson, M.D.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
College of Science and Engineering > School of Engineering > Biomedical Engineering
Journal Name:Optics Express
Publisher:Optical Society of America
ISSN:1094-4087
ISSN (Online):1094-4087

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