Fabrication and measurement of a photonic crystal waveguide integrated with a semiconductor optical amplifier

Cao, T., Ho, Y.L.D., Heard, P.J., Barry, L.P., Kelly, A.E. and Cryan, M.J. (2009) Fabrication and measurement of a photonic crystal waveguide integrated with a semiconductor optical amplifier. Journal of the Optical Society of America B: Optical Physics, 26(4), pp. 768-777. (doi: 10.1364/JOSAB.26.000768)

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Abstract

A III-V semiconductor photonic crystal (PhC) waveguide is integrated into a semiconductor optical amplifier (SOA); this has the potential to reshape pulses that are distorted and chirped on propagation through the SOA. The PhC waveguide is modeled using the three-dimensional (3D) finite difference time domain (FDTD) method initially for the ideal case of infinite depth holes, and this shows a ministop band close to 1600 nm. The PhC waveguide is then fabricated into a commercial SOA using focused ion beam etching. The optical power measured at the output of the PhC-SOA waveguide shows evidence of a ministop band but with a small stopband depth. More realistic 3D FDTD modeling including effects of finite hole depth and vertical layer structure is then shown to give much better agreement with measured results. Finally predictions are made for the performance of a membrane structure.

Item Type:Articles
Keywords:Amplifier, band, crystal, England, etching, fabrication, focused ion-beam, layer, optics, performance, physics, prediction, propagation, pulse, pulse-compression, pulses, semiconductor, slow light, time
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Kelly, Professor Anthony
Authors: Cao, T., Ho, Y.L.D., Heard, P.J., Barry, L.P., Kelly, A.E., and Cryan, M.J.
Subjects:Q Science > QC Physics
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of the Optical Society of America B: Optical Physics
ISSN:0740-3224
ISSN (Online):1520-8540
Published Online:23 March 2009

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