Zhang, Y., Docherty, K.E., and Weaver, J. (2010) Batch fabrication of cantilever array aperture probes for scanning near-field optical microscopy. Microelectronic Engineering, 87 (5-8). pp. 1229-1232. ISSN 0167-9317 (doi:10.1016/j.mee.2009.11.140)
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We have developed a novel batch fabrication process for cantilever array aperture probes used in scanning near-field optical microscopy (SNOM). The array probes, consisting of 16 parallel cantilevers with each tip having an identical aperture, are proposed to dramatically reduce the scanning time for imaging or increase the throughput of near-field optical microscopy and lithography. In this study, apertures are defined by direct-write electron beam lithography and subsequent pattern transfer by reactive ion etch. Better quality and reproducibility of apertures are demonstrated through optical throughput measurement of the probes. The fabrication of apertures having complex shapes is also demonstrated. The process includes such novel elements as the use of local oxidation of silicon and the use of an aluminium-compatible release etch. The process has demonstrated very high yield with a measured reproducibility of aperture diameter of 5 nm. Thermal oxide cantilevers allow the use of the probes at wavelengths as short as 250 nm.
|Keywords:||Cantilever probes, electron beam, electron beam lithography, fabrication, lithography, nanofabrication, physics, release, scanning near-field optical microscopy (SNOM), silicon|
|Glasgow Author(s):||Weaver, Prof Jonathan and Zhang, Dr Yuan|
|Authors:||Zhang, Y., Docherty, K.E., and Weaver, J.|
|Subjects:||T Technology > TK Electrical engineering. Electronics Nuclear engineering|
|College/School:||College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering|
|Journal Name:||Microelectronic Engineering|
|Published Online:||29 November 2009|