The impact of soft-optical phonon scattering due to high-kappa dielectrics on the performance of sub-100nm conventional and strained Si n-MOSFETs

Yang, L., Watling, J., Barker, J. and Asenov, A. (2005) The impact of soft-optical phonon scattering due to high-kappa dielectrics on the performance of sub-100nm conventional and strained Si n-MOSFETs. In: Physics of Semiconductors AIP Conference Proceedings, Melville, pp. 1497-1498. ISBN 0094-243X

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Item Type:Conference Proceedings
Keywords:Channel, Channels, Degradation, Device, Devices, Dielectrics, Drive, Electron-Mobility, Gate, High-Kappa, Impact, Inversion-Layers, Mobility, Monte Carlo, Monte Carlo Simulation, MOSFET, MOSFETS, N-MOSFETS, Performance, Scatter
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Barker, Professor John and Watling, Dr Jeremy and Asenov, Professor Asen
Authors: Yang, L., Watling, J., Barker, J., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Publisher:AMER INST PHYSICS
ISBN:0094-243X

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