Patterned quantum dot lasers fabricated using electron beam lithography and selective area epitaxy growth

Elarde, V., Coleman, J. and Bryce, A. (2005) Patterned quantum dot lasers fabricated using electron beam lithography and selective area epitaxy growth. In: Lasers and Electro-optic society 2005 - 18th annual meeting of the IEEE, Sydney, Australia, pp. 600-601.

Full text not currently available from Enlighten.


Item Type:Conference Proceedings
Keywords:Beam, Electron, Growth, Laser, Lasers, Lithography, Quantum
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Coleman, Professor James and Bryce, Prof Ann
Authors: Elarde, V., Coleman, J., and Bryce, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Publisher:IEEE

University Staff: Request a correction | Enlighten Editors: Update this record