Performance degradation due to soft optical phonon scattering in conventional and strained Si MOSFETs with high-k gate dielectrics

Yang, L., Watling, J., Asenov, A. and Barker, J. (2004) Performance degradation due to soft optical phonon scattering in conventional and strained Si MOSFETs with high-k gate dielectrics. In: 34th European Solid-State Device research Conference, ESSDERC, Leuven, Belgium,

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Item Type:Conference Proceedings
Keywords:Degradation, Device, Dielectrics, Gate, High-K, MOSFET, MOSFETS, Performance, Scattering, Si, Strained Si, Strained-Si
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Barker, Professor John and Watling, Dr Jeremy and Asenov, Professor Asen
Authors: Yang, L., Watling, J., Asenov, A., and Barker, J.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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