The use of imprint lithography to fabricate high electron mobility transistors

Thoms, S., Macintyre, D., Elgaid, K., Stanley, C. and Thayne, I. (2004) The use of imprint lithography to fabricate high electron mobility transistors. In: International Conference on Electron, Photon, Ion beams and Nanofabrication, San Diego, USA,

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Item Type:Conference Proceedings
Keywords:Beam, Electron, Electron-Mobility, High Electron Mobility Transistor, High Electron Mobility Transistors, Imprint, Ion, Lithography, Mobility, Nanofabrication, Transistors
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Thayne, Professor Iain and Thoms, Dr Stephen and Stanley, Professor Colin and Elgaid, Dr Khaled and Macintyre, Dr Douglas
Authors: Thoms, S., Macintyre, D., Elgaid, K., Stanley, C., and Thayne, I.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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