The fabrication of 50nm T-gates using a PMMA.LOR.UVIII resist stack

Chen, Y., Macintyre, D., Gourlay, D., Boyd, E., Moran, D., Cao, X., Thayne, I. and Thoms, S. (2003) The fabrication of 50nm T-gates using a PMMA.LOR.UVIII resist stack. In: EIPBN 2003 - Electron, ion and photon beam tehcnology and nanofabrication, Tampa, USA,

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Item Type:Conference Proceedings
Keywords:Beam, Electron, Fabrication, Ion, Nanofabrication, T-Gates
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Thayne, Professor Iain and Thoms, Dr Stephen and Macintyre, Dr Douglas
Authors: Chen, Y., Macintyre, D., Gourlay, D., Boyd, E., Moran, D., Cao, X., Thayne, I., and Thoms, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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