Beyond SiO2 technology: The impact of high-k dielectrics

Ferrari, G., Watling, J., Roy, S., Barker, J. and Asenov, A. (2006) Beyond SiO2 technology: The impact of high-k dielectrics. In: 6th symposium SiO2 , advanced dielectrics and related devices : SiO2006, Palermo, Italy,

Full text not currently available from Enlighten.


Item Type:Conference Proceedings
Keywords:Device, Devices, Dielectrics, High-K, Impact, Technology
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Barker, Professor John and Watling, Dr Jeremy and Roy, Professor Scott and Asenov, Professor Asen
Authors: Ferrari, G., Watling, J., Roy, S., Barker, J., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

University Staff: Request a correction | Enlighten Editors: Update this record