Fabrication of terahertz holograms

Padgett, M. (2007) Fabrication of terahertz holograms. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 25(6), pp. 2329-2332. (doi: 10.1116/1.2799976)

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Publisher's URL: http://dx.doi.org/10.1116/1.2799976


The authors demonstrate the fabrication of polypropylene eight-level holograms with arbitrary patterns for use in terahertz beam forming and imaging applications. They make a binary master in silicon using multistage deep reactive ion etching. The pattern is then transferred into polypropylene using an imprint technique to make the final hologram. Patterns are tested using a 2 THz quantum cascade laser. The results show that the desired image is formed with the inclusion of a zero order mode. The process is low cost and with high fidelity. The demonstration of holograms in low loss material opens a new field of opportunity for those working on terahertz applications.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Padgett, Professor Miles
Authors: Padgett, M.
College/School:College of Science and Engineering > School of Physics and Astronomy
Journal Name:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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