Low-resistance magnetic tunnel junctions prepared by partial remote plasma oxidation of 0.9 nm Al barriers

Ferreira, R., Freitas, P., MacKenzie, M. and Chapman, J. (2005) Low-resistance magnetic tunnel junctions prepared by partial remote plasma oxidation of 0.9 nm Al barriers. Applied Physics Letters, 86, (doi: 10.1063/1.1925318)

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Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Chapman, Professor John
Authors: Ferreira, R., Freitas, P., MacKenzie, M., and Chapman, J.
College/School:College of Science and Engineering > School of Physics and Astronomy
Journal Name:Applied Physics Letters

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