Lunin, B. S. and Tokmakov, K. V. (2022) The formation of microcrystalline defects on the surface of silica glass arising from mechanochemical processing. International Journal of Applied Glass Science, 13(4), pp. 655-663. (doi: 10.1111/ijag.16558)
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Abstract
The aim of this article is to study the nature of the defects arising on the surface of silica glass during mechanical processing followed by chemical cleaning and etching. Such defects manifest themselves as a narrow Raman peak near 85 cm–1. It is shown that chemical etching of the ground surface of silica glass leads to the formation of microcrystalline defects embedded at the depth of the near-surface layer. Defects of this kind create heterogeneities in the structure of the atomic network and increase internal friction in silica glass mechanical resonators. This phenomenon should be taken into account when developing the technology for fabrication of high-Q resonators.
| Item Type: | Articles |
|---|---|
| Additional Information: | Funding information: Royal Society Cost Share, Grant/Award Number: IE160125; Russian Foundation for Basic Research, Grant/Award Number: 16-52-10069; Royal Society, Grant/Award Number: IE160125. |
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Tokmakov, Dr Kirill |
| Authors: | Lunin, B. S., and Tokmakov, K. V. |
| College/School: | College of Science and Engineering > School of Physics and Astronomy |
| Journal Name: | International Journal of Applied Glass Science |
| Publisher: | Wiley |
| ISSN: | 2041-1286 |
| ISSN (Online): | 2041-1294 |
| Published Online: | 09 February 2022 |
| Copyright Holders: | Copyright © 2022 The Authors |
| First Published: | First published in International Journal of Applied Glass Science 13(4): 655-663 |
| Publisher Policy: | Reproduced under a Creative Commons Licence |
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