Low Damage High Selectivity Cl2/N2/O2-Based Inductively Coupled Plasma Etching for GaN/AlGaN Heterostructures

Al-Moathin, A., Smith, M. D., Thayne, I. , Kuball, M. and Li, C. (2022) Low Damage High Selectivity Cl2/N2/O2-Based Inductively Coupled Plasma Etching for GaN/AlGaN Heterostructures. UKNC Winter Meeting 2022, 05-06 Jan 2022. (Accepted for Publication)

Abstract

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• Item Type: Conference or Workshop Item
• Status: Accepted for Publication
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Li, Professor Chong and Thayne, Prof Iain and Al-Moathin, Mr Ali
• Authors: Al-Moathin, A., Smith, M. D., Thayne, I., Kuball, M., and Li, C.
• College/School: College of Science and Engineering > School of Engineering; College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering

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