Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications

Kettle, J., Hoyle, R.T., Perks, R.M. and Dimov, S. (2008) Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 26(5), pp. 1794-1799. (doi: 10.1116/1.2981081)

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Abstract

In this article, the fabrication and characterization of two-dimensional (2D) and three-dimensional (3D) structures using focused ion beam milling onto templates for step and flash imprint lithography (S-FIL) is discussed. It has been discovered that the 2D linewidth and height are closely related to the ion dose. At low doses (∼1pC/μm2), the surface of the quartz template swells, thus, affecting the shape of the subsequent imprint. Furthermore, it has been shown that during UV curing of the S-FIL resist, the polymeric resist layer contracts as it solidifies, resulting in a dimensionally reduced replication of the original structure. The authors introduce a method to overcome the problem for 3D patterns, using a “multilayer” imprinting technique and apply this technique to the fabrication of “motheye” lenses. With respect to the imprinted replica, they show that the feature profile using this approach has a high fidelity in comparison to the template structure, and thus motheye lenses can be consistently replicated employing the S-FIL technology.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Kettle, Dr Jeff
Authors: Kettle, J., Hoyle, R.T., Perks, R.M., and Dimov, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publisher:American Institute of Physics
ISSN:1071-1023
ISSN (Online):2166-2754
Published Online:02 October 2008

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