Kettle, J., Hoyle, R.T., Perks, R.M. and Dimov, S. (2008) Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 26(5), pp. 1794-1799. (doi: 10.1116/1.2981081)
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Abstract
In this article, the fabrication and characterization of two-dimensional (2D) and three-dimensional (3D) structures using focused ion beam milling onto templates for step and flash imprint lithography (S-FIL) is discussed. It has been discovered that the 2D linewidth and height are closely related to the ion dose. At low doses (∼1pC/μm2), the surface of the quartz template swells, thus, affecting the shape of the subsequent imprint. Furthermore, it has been shown that during UV curing of the S-FIL resist, the polymeric resist layer contracts as it solidifies, resulting in a dimensionally reduced replication of the original structure. The authors introduce a method to overcome the problem for 3D patterns, using a “multilayer” imprinting technique and apply this technique to the fabrication of “motheye” lenses. With respect to the imprinted replica, they show that the feature profile using this approach has a high fidelity in comparison to the template structure, and thus motheye lenses can be consistently replicated employing the S-FIL technology.
Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Kettle, Professor Jeff |
Authors: | Kettle, J., Hoyle, R.T., Perks, R.M., and Dimov, S. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Journal Name: | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Publisher: | American Institute of Physics |
ISSN: | 1071-1023 |
ISSN (Online): | 2166-2754 |
Published Online: | 02 October 2008 |
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