Fabrication of complex 3D structures using Step and Flash Imprint Lithography (S-FIL)

Kettle, J., Hoyle, R.T., Dimov, S. and Perks, R.M. (2008) Fabrication of complex 3D structures using Step and Flash Imprint Lithography (S-FIL). Microelectronic Engineering, 85(5-6), pp. 853-855. (doi: 10.1016/j.mee.2007.12.003)

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Abstract

In this paper, the use of Focused Ion Beam (FIB) milling as an alternative technology to electron-beam lithography in production of complex 3-D-structures such as “Motheye” lenses for Step and Flash Imprint Lithography (S–FIL) templates is discussed. Alterations introduced to conventional template fabrication techniques and the advantages and disadvantages of the proposed template fabrication method over conventional routes are discussed. Comparing the template and replication, we show that the surface topographies are almost identical, and thus FIB milled structures can be consistently replicated employing the S–FIL technology.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Kettle, Dr Jeff
Authors: Kettle, J., Hoyle, R.T., Dimov, S., and Perks, R.M.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Microelectronic Engineering
Publisher:Elsevier
ISSN:0167-9317
ISSN (Online):1873-5568
Published Online:08 January 2008

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