Spacer-defined intrinsic multiple patterning

Laney, S. K., Li, T., Michalska, M., Ramirez, F., Portnoi, M., Oh, J., Tiwari, M. K., Thayne, I. G. , Parkin, I. P. and Papakonstantinou, I. (2020) Spacer-defined intrinsic multiple patterning. ACS Nano, 14(9), pp. 12091-12100. (doi: 10.1021/acsnano.0c05497) (PMID:32813489)

Abstract

Periodic nanotube arrays render enhanced functional properties through their interaction with light and matter, but to reach optimal performance for technologically prominent applications, such as wettability or photonics, structural fine-tuning is essential. Nonetheless, a universal and scalable method providing independent dimension control, high aspect ratios, and the prospect of further structural complexity remains unachieved. Here, we answer this need through an atomic layer deposition (ALD)-enabled multiple patterning. Unlike previous methods, the ALD-deposited spacer is applied on the prepatterned target substrate material, serving as an etching mask to generate a multitude of . By concept iteration, we further realize concentric and/or binary nanoarrays in a number of industrially important materials such as silicon, glass, and polymers. To demonstrate the achieved quality and applicability of the structures, we probe how nanotube fine-tuning induces broadband antireflection and present a surface boasting extremely low reflectance of <1% across the wavelength range of 300-1050 nm.

• Item Type: Articles
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Thayne, Prof Iain
• Authors: Laney, S. K., Li, T., Michalska, M., Ramirez, F., Portnoi, M., Oh, J., Tiwari, M. K., Thayne, I. G., Parkin, I. P., and Papakonstantinou, I.
• College/School: College of Science and Engineering > School of Chemistry
• Journal Name: ACS Nano
• Publisher: American Chemical Society
• ISSN: 1936-0851
• ISSN (Online): 1936-086X
• Published Online: 19 August 2020
• Copyright Holders: Copyright © 2020 American Chemical Society
• First Published: First published in ACS Nano 14(9): 12091-12100
• Publisher Policy: Reproduced in accordance with the publisher copyright policy