W-band on Wafer Measurement of Active and Passive Devices

Edgar, D.L., Elgaid, K., Williamson, F., Ross, A., McLelland, H., Ferguson, S., Doherty, F. , Thayne, I.G. , Taylor, M.R.S. and Beaumont, S.P. (1999) W-band on Wafer Measurement of Active and Passive Devices. In: IEE Colloquium on Microwave Measurements: Current Techniques and Trends, London, UK, 23 Feb 1999, 2/1-2/6. (doi: 10.1049/ic:19990025)

Abstract

In this paper we have presented a study of the effect of back-thinning standard CPW wafers and the influence on measured W-band performance. Improvements in measured insertion loss and substrate cross-talk have been observed, and a study of the effect of a quartz spacer layer has been made. Additionally, the improvement in measured performance of active devices after wafer thinning has also been shown, and further progress is expected in this area.

• Item Type: Conference Proceedings
• Additional Information: Conference number: 1999/008.
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Ferguson, Mrs Susan and Thayne, Prof Iain and McLelland, Mrs Helen and Beaumont, Professor Steve and Doherty, Mr Frederick and Elgaid, Dr Khaled
• Authors: Edgar, D.L., Elgaid, K., Williamson, F., Ross, A., McLelland, H., Ferguson, S., Doherty, F., Thayne, I.G., Taylor, M.R.S., and Beaumont, S.P.
• College/School: College of Science and Engineering > School of Engineering; College of Science and Engineering > School of Physics and Astronomy
• ISSN: 0963-3308