Self-assembly of nanovoids in Si microcrystals epitaxially grown on deeply patterned substrates

Barzaghi, A. et al. (2020) Self-assembly of nanovoids in Si microcrystals epitaxially grown on deeply patterned substrates. Crystal Growth and Design, 20(5), pp. 2914-2920. (doi: 10.1021/acs.cgd.9b01312)

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Abstract

We present an experimental and theoretical analysis of the formation of nanovoids within Si microcrystals epitaxially grown on Si patterned substrates. The growth conditions leading to the nucleation of nanovoids have been highlighted, and the roles played by the deposition rate, substrate temperature, and substrate pattern geometry are identified. By combining various scanning and transmission electron microscopy techniques, it has been possible to link the appearance pits of a few hundred nanometer width at the microcrystal surface with the formation of nanovoids within the crystal volume. A phase-field model, including surface diffusion and the flux of incoming material with shadowing effects, reproduces the qualitative features of the nanovoid formation thereby opening new perspectives for the bottom-up fabrication of 3D semiconductors microstructures.

Item Type:Articles
Additional Information:This research was funded by Regione Lombardia, under the TEINVEIN project, Call Accordi per la Ricerca e l’Innovazione, co-funded by POR FESR 2014-2020 (ID: 242092), and by the EU Horizon-2020 FET microSPIRE project, ID: 766955.
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Paul, Professor Douglas and Valente, Dr Joao
Authors: Barzaghi, A., Firoozabadi, S., Salvalaglio, M., Bergamaschini, R., Ballabio, A., Beyer, A., Albani, M., Valente, J., Voigt, A., Paul, D. J., Miglio, L., Montalenti, F., Volz, K., and Isella, G.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Crystal Growth and Design
Publisher:American Chemical Society
ISSN:1528-7483
ISSN (Online):1528-7505
Published Online:08 April 2020
Copyright Holders:Copyright © 2020 American Chemical Society
First Published:First published in Crystal Growth and Design 20(5):2914-2920
Publisher Policy:Reproduced in accordance with the copyright policy of the publisher

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