Klatt, J., Barcellona, P., Bennett, R. , Bokareva, O. S., Feth, H., Rasch, A., Reith, P. and Buhmann, S. Y. (2017) Strong van der Waals adhesion of a polymer film on rough substrates. Langmuir, 33(21), pp. 5298-5303. (doi: 10.1021/acs.langmuir.7b01381)
Full text not currently available from Enlighten.
Abstract
We propose that chemically inert polymeric films can enhance van der Waals (vdW) forces in the same way as nanofabrication of biomimetic adhesive materials. For the vdW adhesion of an ethylene-chlorotrifluoroethylene (ECTFE) film on rough metal and dielectric substrates, we present a model that combines microscopic quantum-chemistry simulations of the polymer response functions and the equilibrium monomer–substrate distance with a macroscopic quantum-electrodynamics calculation of the Casimir force between the polymer film and the substrate. We predict adhesive forces up to 2.22 kN/mm2, where the effect is reduced by substrate roughness and for dielectric surfaces.
Item Type: | Articles |
---|---|
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Bennett, Dr Robert |
Authors: | Klatt, J., Barcellona, P., Bennett, R., Bokareva, O. S., Feth, H., Rasch, A., Reith, P., and Buhmann, S. Y. |
College/School: | College of Science and Engineering > School of Physics and Astronomy |
Journal Name: | Langmuir |
Publisher: | American Chemical Society |
ISSN: | 0743-7463 |
ISSN (Online): | 1520-5827 |
Published Online: | 10 May 2017 |
University Staff: Request a correction | Enlighten Editors: Update this record