To, W.-K., Fu, J., Yang, X., Roy, V.A.L. and Huang, Z. (2012) Porosification-reduced optical trapping of silicon nanostructures. Nanoscale, 4(19), pp. 5835-5839. (doi: 10.1039/c2nr31680c)
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Abstract
Metal-assisted chemical etching (MACE) was carried out to fabricate solid silicon nanowires (s-SiNWs) and mesoporous silicon nanowires (mp-SiNWs). Total reflection and transmission were measured using an integrated sphere to study optical properties of the MACE-generated silicon nanostructures. Without NW aggregation, mp-SiNWs vertically standing on a mesoporous silicon layer trap less light than s-SiNWs over a wavelength range of 400–800 nm, owing to porosification-enhanced optical scattering from the rough inner surfaces of the mesoporous silicon skeletons. Porosification substantially weakens the NW mechanical strength; hence the elongated mp-SiNWs aggregate after 30 min etching and deteriorate optical trapping.
Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Vellaisamy, Professor Roy |
Authors: | To, W.-K., Fu, J., Yang, X., Roy, V.A.L., and Huang, Z. |
College/School: | College of Science and Engineering > School of Engineering |
Journal Name: | Nanoscale |
Publisher: | Royal Society of Chemistry |
ISSN: | 2040-3364 |
ISSN (Online): | 2040-3372 |
Published Online: | 03 August 2012 |
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