Germanium Quantum Wells in the Conduction Band for Terahertz Emission on Silicon Substrates

Ciano, C. et al. (2018) Germanium Quantum Wells in the Conduction Band for Terahertz Emission on Silicon Substrates. 20th International Conference on Superlattices, Nanostructures and Nanodevices, Madrid, Spain, 23-27 July 2018.

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Abstract

Terahertz (THz) Quantum Cascade Lasers (QCLs) are presently made from III-V semiconductor heterostructures. The use of Ge/SiGe heterostructures in the conduction band, instead, could lead to room temperature operation of such devices [1]. Also, the non-polarity of Ge and Si lattices may help filling the emission wavelength gap between THz and mid-IR QCLs, due to the existence of polar optical phonons in III-V materials. Here we study the THz absorption spectrum of n-type strained Ge/SiGe multi-quantum wells (MQWs) grown on Si (001) substrates by means of ultra-high vacuum chemical vapour deposition. We measure the intersubband transition lines by FTIR spectroscopy of MQWs, symmetric- and asymmetric-coupled MQWs at 70° single-metal waveguide geometry [2]. Supported by theoretical modeling, we discuss the role on the line broadening of electron scattering due to interface roughness, ionized donors, phonons, and extended defects. Experiments with THz pump on three-level Ge/SiGe asymmetric-coupled MQWs are also planned, using a tunable free electron laser as optical pump.

Item Type:Conference or Workshop Item
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Paul, Professor Douglas
Authors: Ciano, C., Montanari, M., Capellini, G., Di Gaspare, L., Virgilio, M., Paul, D., Scalari, G., Birner, S., Baldassarre, L., Ortolani, M., and De Seta, M.
Subjects:Q Science > QC Physics
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Research Group:Semiconductor Devices
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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
301516Far-infrared Lasers Assembled using SiliconDouglas PaulEuropean Commission (EC)766719ENG - Electronics & Nanoscale Engineering