Li, X. , Hemakumara, D., Fu, Y.-C., Moran, D. and Thayne, I. (2019) A Study of In-situ X-ray Photoelectron Spectroscopy Surface Analysis in Development of Atomic Layer Etch for GaN/AlGaN Based Power Device Fabrication. 11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials / 12th International Conference on Plasma-Nano Technology & Science (ISPlasma2019 / IC-PLANTS2019), Nagoya, Japan, 17-21 March 2019.
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Abstract
No abstract available.
Item Type: | Conference or Workshop Item |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Fu, Mr Yen-Chun and Li, Dr Xu and Thayne, Prof Iain and Moran, Professor David and Hemakumara, Miss Dilini |
Authors: | Li, X., Hemakumara, D., Fu, Y.-C., Moran, D., and Thayne, I. |
College/School: | College of Science and Engineering > School of Engineering College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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