Developments of Atomic Layer Etch Processes and their Applications in Fabricating III-V Compound Semiconductor Devices

Li, X. , Fu, Y.-C., Cho, S.-J., Hemakumara, D., Floros, K., Moran, D. and Thayne, I. G. (2019) Developments of Atomic Layer Etch Processes and their Applications in Fabricating III-V Compound Semiconductor Devices. AVS 19th International Conference on Atomic Layer Deposition (ALD 2019) / 6th International Atomic Layer Etching Workshop (ALE 2019), Washington, USA, 21-24 July 2019.

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Abstract

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Item Type:Conference or Workshop Item
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Li, Dr Xu and Cho, Dr Sung-Jin and Moran, Dr David and Floros, Mr Konstantinos and Hemakumara, Miss Dilini
Authors: Li, X., Fu, Y.-C., Cho, S.-J., Hemakumara, D., Floros, K., Moran, D., and Thayne, I. G.
College/School:College of Science and Engineering > School of Engineering
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
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